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6th International Symposium on Plasma and Process-induced Damage

Institute of Electrical and Electronics Engineers
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      This work covers topics such as: damage measurement; plasma characterization and damage mitigation; non-volatile memories; ultra-thin dielectrics; contamination; and multi-terminal effects.
      Format: CONTRIBUTORS: Institute of Electrical and Electronics Engineers EAN: 9780965157759 COUNTRY: United States PAGES: WEIGHT: 0 g HEIGHT: 230 cm
      PUBLISHED BY: I.E.E.E.Press DATE PUBLISHED: 2001-01-01 CITY: GENRE: TECHNOLOGY & ENGINEERING / Electronics / Semiconductors WIDTH: 0 cm SPINE:

      Book Themes:

      Electronic devices and materials

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      This work covers topics such as: damage measurement; plasma characterization and damage mitigation; non-volatile memories; ultra-thin dielectrics; contamination; and multi-terminal effects.
      Format: CONTRIBUTORS: Institute of Electrical and Electronics Engineers EAN: 9780965157759 COUNTRY: United States PAGES: WEIGHT: 0 g HEIGHT: 230 cm
      PUBLISHED BY: I.E.E.E.Press DATE PUBLISHED: 2001-01-01 CITY: GENRE: TECHNOLOGY & ENGINEERING / Electronics / Semiconductors WIDTH: 0 cm SPINE:

      Book Themes:

      Electronic devices and materials

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